Comparison ledger
Oxford Instruments PECVD3 and Oxford Instruments PECVD4, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | PECVD3Oxford Instruments | PECVD4Oxford Instruments |
|---|---|---|
| OEM | Oxford Instruments | Oxford Instruments |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Oxford Instruments PECVD3 | Oxford Instruments PECVD4 |
| Cited variants | — | |
| Specifications | ||
| OEM | Oxford Instruments[1] | Oxford Instruments[1] |
| Model | PECVD3[1] | PECVD4[1] |
| Equipment listing | Oxford Plasmalab System 100 PECVD System[1] | — |
| Process manual reference | PECVD Overview from Oxford Instruments[2] | — |
| Full equipment name | — | Oxford Plasmalab System 100 PECVD System[1] |
| Process reference | — | PECVD SiOx Deposition with 81MHz Power[1] |
Plan your fab
Building a Deposition process? Get a complete equipment list.
Open the fab equipment planner →