Comparison ledger
Oxford Instruments PECVD3 and Oxford Instruments Plasmalab 100, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | PECVD3Oxford Instruments | Plasmalab 100Oxford Instruments |
|---|---|---|
| OEM | Oxford Instruments | Oxford Instruments |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Oxford Instruments PECVD3 | Oxford Instruments Plasmalab 100 |
| Cited variants | — |
|
| Specifications | ||
| OEM | Oxford Instruments[2] | — |
| Model | PECVD3[2] | — |
| Equipment listing | Oxford Plasmalab System 100 PECVD System[2] | — |
| Process manual reference | PECVD Overview from Oxford Instruments[3] | — |
| Dry pump | — | Edwards QDP 40[4] |
| System Control | — | HP PC System, Windows XP[4] |
| Voltage | — | 208 VAC, 3 Phase[4] |
| Full Load | — | 25 A[4] |
| Configuration | — | Gas Box:[4] |
| Gas 1 | — | MKS 1479 A, 5% SiH4 / N2, 1000 SCCM[4] |
| Gas 2 | — | MKS 1479 A, NH3, 100 SCCM[4] |
| Gas 3 | — | MKS 1179 A, N2, 2000 SCCM[4] |
| Gas 4 | — | MKS 1179 A, N2O, 3000 SCCM[4] |
| Gas 5 | — | MKS 1179 A, ,O2, 300 SCCM[4] |
| Gas 6 | — | MKS 1179 A, Ar, 500 SCCM (TEOS carrier gas)[4] |
| TEOS Thermotank | — | Thermocenter salvis lab[4] |
| Chuck | — | φ202 mm（ φ2’, φ4’, φ6’, φ8’）[4] |
| Shower head | — | φ225 mm[4] |
| RF Generator | — | AE RFX 600 A[4] |
| Match Box | — | OPT AMU Oxford[4] |
| LF Generator | — | AE LF-5[4] |
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