Comparison ledger
Oxford Instruments PECVD4 and Oxford Instruments Plasmalab 133, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | PECVD4Oxford Instruments | Plasmalab 133Oxford Instruments |
|---|---|---|
| OEM | Oxford Instruments | Oxford Instruments |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Oxford Instruments PECVD4 | Oxford Instruments Plasmalab |
| Cited variants | — | |
| Specifications | ||
| OEM | Oxford Instruments[1] | — |
| Model | PECVD4[1] | — |
| Full equipment name | Oxford Plasmalab System 100 PECVD System[1] | — |
| Process reference | PECVD SiOx Deposition with 81MHz Power[1] | — |
| Frequency | — | 50 Hz[2] |
| Voltage | — | 415 Vac 3[2] |
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