Comparison ledger
Oxford Instruments Plasmalab 800 Plus and Oxford Instruments PlasmaPro NGP 1000, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | Plasmalab 800 PlusOxford Instruments | PlasmaPro NGP 1000Oxford Instruments |
|---|---|---|
| OEM | Oxford Instruments | Oxford Instruments |
| Category | Deposition | Deposition |
| Wafer size | — | up to 450mm wafer size |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Oxford Instruments Plasmalab 800 | Oxford Instruments PlasmaPro NGP 1000 |
| Specifications | ||
| Configuration | Nitride[1] | Load Locked Chamber[2] |
| Voltage | 208 V[1] | — |
| Frequency | 60 Hz[1] | — |
| Phase | 3+ Neutral / earth[1] | — |
| Wafer size | — | up to 450mm wafer size[2] |
| Power | — | 600W 13.56Mhz HF RF Generator[2] |
Plan your fab
Building a Deposition process? Get a complete equipment list.
Open the fab equipment planner →