Comparison ledger
Quintel Q 4000 Series Mask, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Q 4000 Series MaskQuintel | 150 e MaskSUSS MicroTec |
|---|---|---|
| OEM | Quintel | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Quintel Q 4000 Series Mask | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Configuration | Illumination Controller[1] | — |
| Make | Quintel[1] | — |
| Model | Q 4000 Series[1] | — |
| Tool type | Mask Aligner[1] | — |
| Printing modes | Vacuum and contact printing[2] | — |
| Substrate size | up to 100mm (4") diameter[2] | — |
| Mask size | 4" or 5"[2] | — |
| Alignment stage | Manual X-Y joystick and micrometer theta alignment stage[2] | — |
| Print resolution | 1 micron (with vacuum mode)[2] | — |
| Viewing system | VideoView CCTV splitfield/singlefield microscope with zoom[2] | — |
| Backside alignment | IR capability[2] | — |
| Exposure wavelengths | 365 nm (Channel A), 405 nm (Channel B)[3] | — |
| Gap spacing | 30 µm[3] | — |
| Lamp intensity unit | mW/cm²[3] | — |
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