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Quintel

Q 4000 Series Mask

LithographyQuintel Q 4000 Series Mask family
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This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

The Quintel Q 4000 Series Mask Aligner is a lithography mask aligner. The Quintel Q 4000 Series Mask Aligner supports vacuum and contact printing. The Quintel Q 4000 Series Mask Aligner exposes substrates up to 100mm (4") diameter.[1][2]

Q 4000 Series Mask — Inventory photo
Fig. 01Q 4000 Series MaskInventory photo[3]

Vacuum

Vacuum and contact printing[1]

Performance

IR capability[1]

Optics

Illumination Controller[3]

What it is

General reference — not yet source-verified

Mask aligners are photolithography tools that align a patterned mask to a resist-coated substrate and then expose the substrate to transferred light. Mask aligners are used where direct mask-to-substrate registration is needed for patterned layers in microfabrication.

How it works

The Quintel Q4000 MA supports both vacuum and contact printing. The Quintel Q4000 MA has manual X-Y joystick and micrometer theta alignment stage capability. The Quintel Q4000 MA includes a VideoView CCTV splitfield or singlefield microscope with zoom. The Quintel Q4000 MA also has IR capability for back side alignment.[1]

Where it fits in the process flow

General reference — not yet source-verified

Mask aligners are used in lithography modules after substrate preparation and photoresist coating, and before resist development and subsequent etch, deposition, implant, or lift-off steps. Mask aligners fit process flows that rely on full-field exposure of a mask pattern onto a substrate.

What do the numbers mean?

Vacuum & pumping2

Printing modes
Vacuum and contact printing[1]
Accurate?
Print resolution
1 micron (with vacuum mode)[1]
Accurate?

Wafer handling1

Substrate size
up to 100mm (4") diameter[1]
Accurate?

Optics & imaging4

Illumination Controller[3]
Accurate?
Tool type
Mask Aligner[3]
Accurate?
Mask size
4" or 5"[1]
Accurate?
Exposure wavelengths
365 nm (Channel A), 405 nm (Channel B)[2]
Accurate?

Performance2

Alignment stage
Manual X-Y joystick and micrometer theta alignment stage[1]
Accurate?
Backside alignment
IR capability[1]
Accurate?

Configuration & options5

Make
Quintel[3]
Accurate?
Model
Q 4000 Series[3]
Accurate?
Viewing system
VideoView CCTV splitfield/singlefield microscope with zoom[1]
Accurate?
Gap spacing
30 µm[2]
Accurate?
Lamp intensity unit
mW/cm²[2]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Printing modesVacuum and contact printing[1]
  • Print resolution1 micron (with vacuum mode)[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What kind of equipment is the Quintel Q 4000 Series?

The Quintel Q 4000 Series is a mask aligner used for lithography.[3][4][5]

What exposure source does the Q4000 use?

The standard exposure illumination source in the Q4000 Aligner is a mercury short arc ultraviolet lamp.[6]

What substrate size does the Quintel Q4000 MA support?

The Quintel Q4000 MA supports substrates from pieces to 100mm (4”) diameter, and it exposes both partial and whole substrates up to 100mm (4”) diameter.[1]

Does the Quintel Q4000 MA support backside alignment?

The Quintel Q4000 MA has IR capability for back side alignment.[1]

Not publicly documented

The following facts about the Q 4000 Series Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Q 4000 Series Mask are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the Q 4000 Series Mask are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the Q 4000 Series Mask are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Q 4000 Series Mask are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the Q 4000 Series Mask is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (6)Every fact above is drawn from these public sources
  1. [1]sharedfacilities.pitt.edu — sharedfacilities.pitt.edusharedfacilities.pitt.edu
  2. [2]manuallib.com — manuallib.commanuallib.com
  3. [3]Inventory photo
  4. [4]Q 4000 Series Mask — Quintel | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
  5. [5]Quintel Q 4000 Series Mask family | Waferpedia — waferpedia.comwaferpedia.com
  6. [6]https://kb.encs.vancouver.wsu.edu/wp-content/uploads/sites/7/2023/08/q4000_rev_c-1.pdf — kb.encs.vancouver.wsu.edukb.encs.vancouver.wsu.edu
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Last updated Oct 19, 2026.

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