Quintel
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Quintel Q 4000 Series Mask Aligner is a lithography mask aligner. The Quintel Q 4000 Series Mask Aligner supports vacuum and contact printing. The Quintel Q 4000 Series Mask Aligner exposes substrates up to 100mm (4") diameter.[1][2]

Mask aligners are photolithography tools that align a patterned mask to a resist-coated substrate and then expose the substrate to transferred light. Mask aligners are used where direct mask-to-substrate registration is needed for patterned layers in microfabrication.
The Quintel Q4000 MA supports both vacuum and contact printing. The Quintel Q4000 MA has manual X-Y joystick and micrometer theta alignment stage capability. The Quintel Q4000 MA includes a VideoView CCTV splitfield or singlefield microscope with zoom. The Quintel Q4000 MA also has IR capability for back side alignment.[1]
Mask aligners are used in lithography modules after substrate preparation and photoresist coating, and before resist development and subsequent etch, deposition, implant, or lift-off steps. Mask aligners fit process flows that rely on full-field exposure of a mask pattern onto a substrate.
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
No research found yet — worked with this tool? Share what you know.
The Quintel Q 4000 Series is a mask aligner used for lithography.[3][4][5]
The standard exposure illumination source in the Q4000 Aligner is a mercury short arc ultraviolet lamp.[6]
The Quintel Q4000 MA supports substrates from pieces to 100mm (4”) diameter, and it exposes both partial and whole substrates up to 100mm (4”) diameter.[1]
The Quintel Q4000 MA has IR capability for back side alignment.[1]
The following facts about the Q 4000 Series Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Q 4000 Series Mask are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Q 4000 Series Mask are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Q 4000 Series Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Q 4000 Series Mask are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Q 4000 Series Mask is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Last updated Oct 19, 2026.
Brooks 017-0146-01 is a prealigner manufactured by Brooks.
The Ultratech 1000 Family is a photolithography step-and-repeat 1X steppers family using the Wynne Dyson optical design.
The EVG 101 is an advanced resist processing system for spin or spray coating and developing of wafers up to 300 mm.