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Comparison ledger

03 RR 8120-001-001 Wafer ExchangerversusWaferStorm 3303 Automated Solvent Processor

Rorze 03 RR 8120-001-001 Wafer Exchanger, Veeco WaferStorm 3303 Automated Solvent Processor, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
OEMRorzeVeeco
CategoryTest & ProbeTest & Probe
Wafer size—Load port-TDK with wafer mapping and RFID reader
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyRorze 03 RR 8120-001-001 Wafer ExchangerVeeco Waferstorm
Specifications
Wafer size8 inch[1]Load port-TDK with wafer mapping and RFID reader[3]
ManufacturerRorze[1]—
Model03 RR 8120-001-001[1]WaferStorm 3303[3]
Equipment typeWafer Exchanger[1]—
Configuration—Single 300mm FOUP load port for high volume platform[3]
Station 1—Solvent Immersion 200/300mm (Fill by NMP Fresh Supply)[3]
Load port—Single 300mm FOUP load port; load port-TDK with wafer mapping and RFID reader[3]
Wafer sizes—200/300mm; 200-mm adapter plate allows 200mm cassette in place of 300mm FOUP[3]
Construction—Stainless steel with mirror finish[3]
User interface—PC-based user interface with local data storage[3]
Data storage—SOL-based database RAID drive for control system and data storage[3]
Host interface—SECS/GEM software for host interface[3]
Fire suppression—CO2 Fire suppression system for 90" frame; IR detector, 120-degree viewing angle and Linear Heat Detector Wire[3]
Power backup—UPS battery backup for PC[3]
Status light—3-Color LED status light lower (red, yellow, green)[3]
Filtration—ULPA Filter with Air Ionizer bar (Standard ESD level l)[3]
Robotic wafer handler—Vertical, rotary, two paddle axes; additional paddle axis (2); vacuum paddles (4); wafer alignment with LED backlight, color camera, and PC image processing; handler cover drain[3]
Station 2—MLO Spin Process chamber with grip actuator and spindle motor; Haler chamber with exhaust pressure, temperature and cover interlock sensors; CCD camera for chamber monitoring and video archive with LED lighting; spin chuck-200/300mm (Active Edge Grip, Stainless Steel)[3]
Dispense Arm 2—Dual-position feedback; Dispense A: LPD stream (NMP Fresh or Recirculated, Heated); Dispense B: HPC Fan-spray (NMP Recirculated, Heated); Dispense C: HPC Needle-spray (NMP Recirculated, Heated); continuous-duty 35:1 high-pressure pump and high-pressure filter; heater-SS 2-kW single path (Dispense A); heater-SS 2-kW dual path (Dispense B&C)[3]
Dispense Arm 3—Dual-position feedback; Dispense A: LPD stream (NMP Recirculated, Heated); Dispense B: High-velocity spray (NMP Recirculated, Heated); shared heater-SS 3-kW, single path[3]
Wall-mounted dispenses—Stationary with adjustable nozzles; wall-dispense nozzle (NMP Recirculated or Fresh, Heated); shared heater-SS 3-kW, single path (Wall Dispense, Backside Rinse A&B)[3]
Backside dispenses—Adjustable nozzles; backside nozzle-A&B: LPD Stream (NMP Recirculated or Fresh, Heated)[3]
Chamber rinse—6 nozzles (NMP Recirculated, Ambient)[3]
Drain diverter Station 2—Teflon 3-way (NMP recirculation/Solvent drain)[3]
Station 3—SRD Spin Process chamber with grip actuator and spindle motor; Haler chamber with exhaust pressure, temperature and cover interlock sensors; CCD camera with LED lighting; O2 monitoring system with high-flow N2 purge and O2 sensor integrated into the chamber exhaust[3]
Spin chuck Station 3—200/300mm (Active Edge Grip, Stainless Steel)[3]
Dispense Arm 2 Station 3—Dual-position feedback; Dispense A: LPD stream (IPA Ambient); Dispense B: High-velocity spray (IPA Ambient)[3]
Dispense Arm 3 Station 3—Dual-position feedback; Dispense A: LPD stream (DIW, Ambient)[3]
Dispense Arm 4 Station 3—Dual-position feedback; N2 heated dispense with programmable 400-W heater, 0.003-µm filter[3]
Wall-mounted dispenses Station 3—Stationary with adjustable nozzles; wall-dispense nozzle A: (IPA, Ambient); backside nozzles-A&B: (IPA, Ambient); chamber rinse--6 nozzles (IPA, Ambient); drain diverter Teflon 3-way (IPA drain/Industrial drain)[3]
Heater-SS 3-kW, single path—6kW total heat (2)[3]
DFR solvent strainer—Triple-Stage with automatic flush feature[3]
Dispense A—LPD stream (NMP Fresh or Recirculated, Heated)[3]
Dispense B—HPC Fan-spray (NMP Recirculated, Heated)[3]
Dispense C—HPC Needle-spray (NMP Recirculated, Heated)[3]
Continuous-duty 35—1 high-pressure pump and high-pressure filter[3]
Wall-dispense nozzle—(NMP Recirculated or Fresh, Heated)[3]
Backside nozzle-A&B—LPD Stream (NMP Recirculated or Fresh, Heated)[3]
02 Monitoring system—High-flow N2 purge with 02 sensor integrated into the chamber exhaust[3]
Wall-dispense nozzle A—(IPA, Ambient) Backside dispenses with adjustable nozzles Backside nozzles-A&B: (IPA, Ambient)[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]inventory listing