Waferpedia

Comparison ledger

11600 SRDversusR3A-LMC

Semitool 11600 SRD, YES R3A-LMC, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
11600 SRDSemitool
OEMSemitoolYES
CategoryWet Processing / CleanWet Processing / Clean
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilySemitool 11600 SRDYES R3A-LMC
Specifications
ConfigurationCeramic[1]—
ManufacturerSemitool[1]—
Model11600 SRD[1]R3A-LMC[2]
Equipment typeSpin Rinse Dryer[1]—
Designed for—fast, uniform cleaning of lead frames and carrier borne devices loaded into one or two open-sided magazines[2]
Chamber design—parallel plate design[2]
Plasma uniformity—uniform plasma throughout the magazine[2]
Plasma modes—Active Plasma mode, RIE Plasma, Electron-free Plasma[2]
Plasma direction—left to right, right to left, or from both sides simultaneously[2]
Plasma gas inputs—two plasma gas inputs[2]
Back-fill gas input—provided for venting the chamber back to atmospheric pressure in an inert atmosphere, normally nitrogen[2]
Diagnostics display—plain English[2]
Readouts—plain English[2]
Function—Automatic plasma cleaning of lead frames and Auer boats[2]
Target products—Lead frames and carrier borne devices loaded into one or two open-sided magazines[2]
Design—Parallel plate design[2]
Gas inputs—Two plasma gas inputs[2]
Control/readout language—Plain English readouts and diagnostics[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]web.archive.orgweb.archive.org