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YES

R3A-LMC

Wet Processing / CleanYES R3A-LMC family
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The YES R3A-LMC is a lead frame plasma cleaner. The YES R3A-LMC is specifically designed for fast, uniform cleaning of lead frames and carrier borne devices loaded into one or two open-sided magazines. The YES R3A-LMC uses a parallel plate design with three plasma modes and two plasma gas inputs.[1]

R3A-LMC — web.archive.org
Fig. 01R3A-LMCweb.archive.org[1]

Performance

uniform plasma throughout the magazine[1]

Gas delivery

two plasma gas inputs[1]

What it is

The YES R3A-LMC is a plasma cleaner for lead frames and carrier-borne devices loaded into one or two open-sided magazines. The YES R3A-LMC is designed for fast, uniform cleaning. The YES R3A-LMC uses a parallel-plate design to provide uniform plasma throughout the magazine. The YES R3A-LMC provides two plasma gas inputs and three plasma modes. The YES R3A-LMC also includes a back-fill gas input for chamber venting.[1]

How it works

The YES R3A-LMC is arranged so plasma and plasma gas flow horizontally over stacked sample surfaces within the magazine. The YES R3A-LMC can be configured for different sample sizes and contamination levels by changing the positions of slide-in electrodes. The YES R3A-LMC can operate in Active Plasma mode for routine use. The YES R3A-LMC can operate in RIE Plasma mode for more aggressive cleaning. The YES R3A-LMC can operate in Electron-free Plasma mode for sensitive electronic components such as C-MOS devices. The YES R3A-LMC can direct plasma from left to right, from right to left, or from both sides simultaneously. The YES R3A-LMC supports quick selection of a single gas or a two-gas sequence, including oxygen followed by argon. The YES R3A-LMC can vent the chamber back to atmospheric pressure in an inert atmosphere, normally nitrogen, at the end of the process.[1]

The YES R3A-LMC has double safety interlocks on RF, vacuum, and gas control functions. The YES R3A-LMC automatically shuts down in a sealed condition if a control parameter goes out of limit. The YES R3A-LMC provides an audible abort signal and a flashing light during an abort mode. The YES R3A-LMC displays the reason for shutdown and suggested remedial action in plain English.[1]

Where it fits in the process flow

General reference — not yet source-verified

Plasma cleaning tools of this class are typically inserted before process steps that depend on a clean and activated surface. Plasma cleaning commonly precedes die attach, wire bonding, underfill, molding, lid seal, coating, or adhesive joining in device and package manufacturing. Plasma cleaning can also be used after handling or storage steps when organic residue or airborne contamination must be reduced before the next operation.

Applications

The YES R3A-LMC is intended for cleaning lead frames and carrier-borne devices in magazines. The broader YES plasma cleaning system family is used for devices, leadframes, BGAs, singulated packages in boats, ceramic substrates, and PCBs. The YES R3A-LMC includes an electron-free plasma mode for sensitive electronic components such as C-MOS devices.[1]

  • lead frames
  • carrier-borne devices
  • electronic components

What do the numbers mean?

Vacuum & pumping2

Back-fill gas input
provided for venting the chamber back to atmospheric pressure in an inert atmosphere, normally nitrogen[1]
Accurate?
Back-fill gas input
Provided for chamber venting back to atmospheric pressure in an inert atmosphere[1]
Accurate?

Wafer handling2

Designed for
fast, uniform cleaning of lead frames and carrier borne devices loaded into one or two open-sided magazines[1]
Accurate?
Target products
Lead frames and carrier borne devices loaded into one or two open-sided magazines[1]
Accurate?

Gas & chemistry2

Plasma gas inputs
two plasma gas inputs[1]
Accurate?
Gas inputs
Two plasma gas inputs[1]
Accurate?

Performance1

Plasma uniformity
uniform plasma throughout the magazine[1]
Accurate?

Control & software1

Control/readout language
Plain English readouts and diagnostics[1]
Accurate?

Configuration & options9

Model
R3A-LMC[1]
Accurate?
Chamber design
parallel plate design[1]
Accurate?
Plasma modes
Active Plasma mode, RIE Plasma, Electron-free Plasma[1]
Accurate?
Plasma direction
left to right, right to left, or from both sides simultaneously[1]
Accurate?
Diagnostics display
plain English[1]
Accurate?
Readouts
plain English[1]
Accurate?
Function
Automatic plasma cleaning of lead frames and Auer boats[1]
Accurate?
Design
Parallel plate design[1]
Accurate?
Plasma modes
Active Plasma, RIE Plasma, Electron-free Plasma[1]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Plasma gas inputstwo plasma gas inputs[1]
  • Back-fill gas inputprovided for venting the chamber back to atmospheric pressure in an inert atmosphere, normally nitrogen[1]
  • Gas inputsTwo plasma gas inputs[1]
  • Back-fill gas inputProvided for chamber venting back to atmospheric pressure in an inert atmosphere[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What does the YES R3A-LMC clean?

The YES R3A-LMC cleans lead frames and carrier-borne devices loaded into one or two open-sided magazines.[1]

What plasma modes does the YES R3A-LMC support?

The YES R3A-LMC supports Active Plasma mode, RIE Plasma mode, and Electron-free Plasma mode.[1]

How is plasma distributed in the YES R3A-LMC chamber?

The YES R3A-LMC uses a parallel-plate design to provide uniform plasma throughout the magazine. The YES R3A-LMC also provides horizontal flow of plasma and plasma gas over the stacked sample surfaces within the magazine.[1]

What gas handling features does the YES R3A-LMC provide?

The YES R3A-LMC provides two plasma gas inputs for quick selection of a single gas or a two-gas sequence. The YES R3A-LMC also provides a back-fill gas input so the chamber can be vented back to atmospheric pressure in an inert atmosphere, normally nitrogen, at the end of the process.[1]

What happens if the YES R3A-LMC detects an out-of-limit condition?

The YES R3A-LMC issues an audible abort signal and a flashing light, automatically shuts down in a sealed condition, and displays the reason for shutdown and suggested remedial action in plain English.[1]

Not publicly documented

The following facts about the R3A-LMC are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the R3A-LMC are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the R3A-LMC are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the R3A-LMC are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the R3A-LMC are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the R3A-LMC is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (1)Every fact above is drawn from these public sources
  1. [1]web.archive.org — web.archive.orgweb.archive.org
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Last updated Oct 17, 2026.

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