YES
R3A-LMC
What is it?
What can it run?
Process applications and technology nodes documented for this tool.
- lead frames
- carrier-borne devices
- electronic components
What do the numbers mean?
Vacuum & pumping1
- Back-fill gas input
- provided for venting the chamber back to atmospheric pressure in an inert atmosphere, normally nitrogen[1]
Wafer handling1
- Designed for
- fast, uniform cleaning of lead frames and carrier borne devices loaded into one or two open-sided magazines[1]
Gas & chemistry1
Performance1
Configuration & options6
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What materials or products is the YES R3A-LMC used to clean?
It is designed for fast, uniform cleaning of lead frames and carrier-borne devices loaded into one or two open-sided magazines.[1]
What plasma modes are available on the YES R3A-LMC?
The system can be operated in Active Plasma mode, RIE Plasma mode, or Electron-free Plasma mode by changing the positions of the slide-in electrodes.[1]
How does the machine handle plasma gases?
It provides two plasma gas inputs and a back-fill gas input. The gas can be selected as a single gas or a two-gas sequence, and the chamber can be vented back to atmospheric pressure in an inert atmosphere at the end of the process.[1]
How is the product moved through the process?
An incoming transport magazine is transferred to a CLEANMAG process magazine within the plasma cleaning chamber, and after cleaning the product is returned to the original magazine for the next process stage.[1]
Not publicly documented
The following facts about the R3A-LMC are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the R3A-LMC are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the R3A-LMC are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the R3A-LMC are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the R3A-LMC are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the R3A-LMC is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]web.archive.org — web.archive.orgweb.archive.org
Last updated Jul 29, 2026.
Compare with similar tools
View all →The Glen/YES 1000FP is a plasma cleaning system designed to accept a range of shelf sizes for changing flat panel industry needs.
The 1000P is a plasma cleaning system with four 16 x 16 inch shelves and a total capacity of 1024 square inches.