Comparison ledger
SPTS CET25 and SPTS CPX Pegasus, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | CET25SPTS | CPX PegasusSPTS |
|---|---|---|
| OEM | SPTS | SPTS |
| Category | Etch | Etch |
| Wafer size | 25-wafer batch | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | SPTS CET25 | SPTS CPX Pegasus |
| Specifications | ||
| Process type | HF vapor release etch for MEMS[1] | — |
| Batch size | 25-wafer batch[1] | — |
| Target application | Medium to high volume production applications[1] | — |
| Key benefits | High throughput; process chamber, gas and liquid panel, and pressure control components within a small footprint; extensive process control and monitoring functions[1] | — |
| Configuration support | Various SPTS cluster configurations with the ability to support multiple process modules[1] | — |
| Configuration | — | 2 Chambers[2] |
| Frequency | — | 60Hz[2] |
| Source RF Generator | — | MKS 6.5 kw RF Power Generator[2] |
| Platen RF Generator | — | MKS/ENI ACG 3B 13.56MHz RF Generator[2] |
| Rotary Pump | — | 3 PCS[2] |
| Turbo pump | — | 2 PCS[2] |
| DI Water | — | SMC HRZ-L2-DY chiller[2] |
| Silicon oil | — | SMC HRZL-D chiller[2] |
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