Comparison ledger
SPTS MVD100E and SPTS MVD4500, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | MVD100ESPTS | MVD4500SPTS |
|---|---|---|
| OEM | SPTS | SPTS |
| Category | Deposition | Deposition |
| Wafer size | 200mm | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | SPTS MVD100E | SPTS MVD4500 |
| Specifications | ||
| processing mode | Single substrate or small batch processing[1] | — |
| wafer size | 200mm wafers[1] | — |
| substrate handling | Components on trays or racks[1] | — |
| chamber volume | Small chamber volume for fast processing[1] | — |
| access design | Top-opening for ease of maintenance and cleaning[1] | — |
| process capability | Integrated plasma surface treatment and chamber clean capability[1] | — |
| automation | Automated process sequence routines[1] | — |
| diagnostics | Exceptional reliability with extensive self-diagnostic and data logging capability[1] | — |
| capability | MVD and ALD-capable[1] | — |
| Tool type | — | Panel and large substrate tool[2] |
| Maximum substrate size | — | Up to 930 x 720 mm[2] |
| Processing mode | — | Batch processing[2] |
| Standard substrates | — | Gen 4.5 substrates; glass, polymer sheets, metals[2] |
| Precursors | — | Up to 4 precursors[2] |
| Capabilities | — | Integrated plasma surface treatment and chamber clean capability[2] |
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