SPTS

MVD100E

Research Quality: 40% complete

What is it?

The SPTS MVD100E is a Molecular Vapor Deposition system described as a designated tool for R&D or pilot manufacturing. The source states it is intended for high performance, flexibility, and reliability, and lists features including single substrate or small batch processing, 200mm wafers, top-opening access, integrated plasma surface treatment and chamber clean capability, automated process sequence routines, and data logging.

What can it run?

Process applications and technology nodes documented for this tool.

MEMS devices
sensors
actuators
displays
RF switches
inkjets
data storage devices
BioMEMS
wetting control in micro-fluidics
lab-on-a-chip
microplates
passivation on implantable devices requiring biocompatible surface coatings
devices requiring functionalized surface coatings
genome sequencing
diagnostics
production applications requiring moisture barriers
anticorrosion coatings
release layers for imprinting

What do the numbers mean?

Wafer handling3

processing mode: Single substrate or small batch processing^[1]
wafer size: 200mm wafers^[1]
substrate handling: Components on trays or racks^[1]

Configuration & options6

chamber volume: Small chamber volume for fast processing^[1]
access design: Top-opening for ease of maintenance and cleaning^[1]
process capability: Integrated plasma surface treatment and chamber clean capability^[1]
automation: Automated process sequence routines^[1]
diagnostics: Exceptional reliability with extensive self-diagnostic and data logging capability^[1]
capability: MVD and ALD-capable^[1]

Interested in this tool?

Embed spec card

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Not publicly documented

The following facts about the MVD100E are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MVD100E are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the MVD100E are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the MVD100E are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the MVD100E are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the MVD100E is not on record.
Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (1)Every fact above is drawn from these public sources

[1]web.archive.org — web.archive.orgweb.archive.org

Was this page accurate?

Last updated Jul 29, 2026.

Compare with similar tools

View all →

635LLDenton Vacuum

CategoryDepositionWafer200mm

5 specs

MVD100E vs 635LL →

E 2000 Epitaxial ReactorASM

The ASM E 2000 is a radiantly heated, single-wafer epitaxial reactor for chemical vapor deposition of doped or undoped silicon layers on wafers up to 200 mm (8 inches).

CategoryDepositionWafer200mm

50 specs

MVD100E vs E 2000 Epitaxial Reactor →