Comparison ledger
SPTS MVD4500 and SPTS Sigma, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | MVD4500SPTS | SigmaSPTS |
|---|---|---|
| OEM | SPTS | SPTS |
| Category | Deposition | Deposition |
| Wafer size | — | A 1KW lamp for wafer heating |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | SPTS MVD4500 | SPTS Sigma |
| Specifications | ||
| Tool type | Panel and large substrate tool[1] | — |
| Maximum substrate size | Up to 930 x 720 mm[1] | — |
| Processing mode | Batch processing[1] | — |
| Standard substrates | Gen 4.5 substrates; glass, polymer sheets, metals[1] | — |
| Precursors | Up to 4 precursors[1] | — |
| Capabilities | Integrated plasma surface treatment and chamber clean capability[1] | — |
| Configuration | — | Beta System[2] |
| Phase | — | Power Box (415 VAC, 3 Phase)[2] |
| Station 1 | — | Vacuum Cassette Handler (VCH)[2] |
| Station 2 | — | Pre Heat Chambers[2] |
| Wafer size | — | A 1KW lamp for wafer heating[2] |
| Station 3 | — | Aluminum Dep Chamber[2] |
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