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Comparison ledger

3302 Resist Removal and Waferversus1000FP

SSEC 3302 Resist Removal and Wafer, YES 1000FP, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
OEMSSECYES
CategoryWet Processing / CleanWet Processing / Clean
Wafer sizeWafer processing modules (2)—
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilySSEC 3302 Resist Removal and WaferYES 1000FP
Specifications
Wafer sizeWafer processing modules (2)[1]—
Voltage220V, 3 Ph, 60 Hz, 30A[1]—
OEMSSEC[1]—
Model3302[1]Glen/YES 1000FP[3]
CategoryWet Processing / Clean[2]—
Machine typeResist Removal and Wafer Cleaner[1]—
Wafer processing modules2[1]—
Wafer elevators2[1]—
Power220V, 3 Ph, 60 Hz, 30A[1]—
System type—Plasma cleaning system[3]
Line—R-Series Plasma Cleaning Systems (Glen Technologies)[3]
Designed use—Designed to accept a range of shelf sizes[3]
Application focus—Changing needs of the flat panel industry[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]web.archive.orgweb.archive.org