Comparison ledger
SUSS MicroTec 150 e Mask, SUSS MicroTec MJB 3 Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 150 e MaskSUSS MicroTec | MJB 3 MaskSUSS MicroTec |
|---|---|---|
| OEM | SUSS MicroTec | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | SUSS MicroTec 150 e Mask | SUSS MicroTec MJB |
| Specifications | ||
| Configuration | — | Refurbished[1] |
| Power | — | 350W lamphouse with Ushio USH-350DS Hg lamp[2] |
| Wafer size | — | 3 inch[2] |
| Lamp | — | 350W lamphouse with Ushio USH-350DS Hg lamp[2] |
| Optics type | — | UV400 near UV optics, 350-450 nm[2] |
| Resolution | — | 0.6 µm[2] |
| Microscope | — | Splitfield microscope with Leica objectives 3.5x/10x/20x[3] |
| Vacuum chuck size | — | 3 inch[2] |
| Mask holder size | — | 3x3 inch[2] |
| OEM | — | SUSS MicroTec[4] |
| Model | — | MJB 3[4] |
| Tool type | — | Mask aligner[5] |
| Category | — | Lithography[5] |
| Wafer sizes | — | 3 inch[2] |
| Max wafer size | — | 3" diameter[6] |
| Exposure optics | — | UV400 near UV optics, 350-450 nm[3] |
| Lamp house | — | 350W lamphouse with Ushio USH-350DS Hg lamp[2] |
| Exposure modes | — | Vacuum contact, Hard contact, Soft contact[7] |
| Configured alignment | — | Top side alignment[7] |
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