SUSS MicroTec
MJB 3 Mask
What it is
How it works
The MJB 3 product information states a splitfield microscope, Leica objectives, a 350W lamphouse with an Ushio USH-350DS Hg lamp, UV400 near UV optics, and a wavelength range of 350-450nm. The same product information gives a resolution of 0.6um and lists a 3 inch vacuum chuck and a 3x3 inch mask holder.[2]
Where it fits in the process flow
General reference — not yet source-verifiedMask alignment and exposure occur in the front end of a lithography flow, after substrate preparation and resist coating and before resist development and later pattern transfer steps. The tool is used to define features on the substrate by optical exposure through a mask.
Applications
General reference — not yet source-verifiedMask aligners are used for lithographic patterning in microfabrication, especially where direct mask-to-substrate alignment and optical exposure are needed. They are commonly used for creating photoresist patterns on wafers and other flat substrates in semiconductor and related microdevice work.
What do the numbers mean?
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Configuration3" vacuum chuck[2]
Where are the manuals?
Publicly hosted documents referencing this tool, linked at their original location. Hosted by the linked institutions — availability may change.
- Photo-03 - SOP - MJB-3 Mask Aligner.pdfSOPumd.edu
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What type of lithography tool is this?General reference — not yet source-verified
It is a mask aligner, a class of optical lithography machine that exposes photoresist through a patterned mask.
What role does a mask aligner play in fabrication?General reference — not yet source-verified
It transfers a mask pattern onto a resist-coated substrate so the pattern can be developed and used in later process steps.
How does this class differ from projection lithography tools?General reference — not yet source-verified
A mask aligner uses direct mask-to-substrate alignment for exposure, while projection tools form the pattern through an optical imaging system.
What kinds of materials are processed on this class of machine?General reference — not yet source-verified
It is used on flat substrates that can be coated with photoresist, including semiconductor wafers and other planar workpieces.
What patterns are typically made with this class of tool?General reference — not yet source-verified
It is used for planar resist patterns that define later etch, deposition, or lift-off steps in microfabrication.
Not publicly documented
The following facts about the MJB 3 Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MJB 3 Mask are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the MJB 3 Mask are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the MJB 3 Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the MJB 3 Mask are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the MJB 3 Mask is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (9)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Inventory photo
- [3]Inventory photo
- [4]Inventory photo
- [5]Equipment inventory listing
- [6]Equipment inventory listing
- [7]Equipment inventory listing
- [8]PHOTO-03: MJB-3 Mask aligner- right of spin station #1 | Equipment | Maryland NanoCenter FabLab — nanocenter.umd.edunanocenter.umd.edu
- [9]Mask Aligner | Shared Materials Instrumentation Facility — smif.pratt.duke.edusmif.pratt.duke.edu
Last updated Jul 29, 2026.
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