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Comparison ledger

1512eversusSCCM Shin

Tegal 1512e, Tokyo Electron SCCM Shin, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
1512eTegal
SCCM ShinTokyo Electron
OEMTegalTokyo Electron
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyTegal 1512eTokyo Electron SCCM Shin
Specifications
Tool typeIndustrial RIE plasma etcher system[1]TSP-30555SSS[4]
Stated configurationWith modules assembly for CI-4222[1]—
OEM—Tokyo Electron[2]
Model—SCCM Shin[2]
Category—Etch[3]
Vintage—2005[2]
Description—Oxide etcher with qty 3 chambers[4]
Version—300 mm[4]
Load ports—3[4]
Etch process chambers—3[4]
RF generator (top)—Daihen AGA-50B 60 MHz 5 kW[4]
RF generator (bottom)—Daihen WGA-50E 2 MHz 5 kW[4]
Other chamber component—Daihen DGP-120A2[4]
Gate valves—Vat gate valves[4]
Vacuum pumps—Shimadzu turbo pumps[4]
DC power supplies—Kyosan DC power supplies[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]semistarcorp.comsemistarcorp.com
  2. [2]Equipment inventory listing
  3. [3]waferpedia.comwaferpedia.com
  4. [4]fabsurplus.comfabsurplus.com