Comparison ledger
Tokyo Electron Clean Track ACT 8 Multi Block, YES 1000FP, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Clean Track ACT 8 Multi BlockTokyo Electron | 1000FPYES |
|---|---|---|
| OEM | Tokyo Electron | YES |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | 1997 Date of manufacture · 2017 Date of manufacture | — |
| Control system | — | — |
| Generation | — | — |
| Family | Tokyo Electron Clean Track ACT 8 Multi Block | YES 1000FP |
| Cited variants |
| — |
| Specifications | ||
| Date of Manufacture | 1997-12-31[2] | — |
| Currently Configured for | 200mm[2] | — |
| OEM | Tokyo Electron[1] | — |
| Model | Clean Track ACT 8 Multi Block[2] | Glen/YES 1000FP[5] |
| Type | Multi Block (Resist Coater/Developer)[1] | — |
| Equipment class | Resist Processing Equipment[2] | — |
| Wafer configuration | 200mm[2] | — |
| Date of manufacture | 2017-01-01[1] | — |
| Purpose | Photoresist spin-coater and developer[3] | — |
| Wafer Size | 200mm[4] | — |
| Resist Types | Negative tone and positive tone[3] | — |
| Supported Resists | KMPR-1005 (1002), OIR-647-17(11)[3] | — |
| Pre-wet Solvents | Cyclopentanone or HMDS[3] | — |
| Bake Capabilities | Soft-bake and post-exposure bake[3] | — |
| Interface | Direct interface with ASML stepper[3] | — |
| Equipment Type | Resist Processing Equipment / Multi Block (Resist Coater/Developer)[2] | — |
| System type | — | Plasma cleaning system[5] |
| Line | — | R-Series Plasma Cleaning Systems (Glen Technologies)[5] |
| Designed use | — | Designed to accept a range of shelf sizes[5] |
| Application focus | — | Changing needs of the flat panel industry[5] |
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