Comparison ledger
Zeiss 1540EsB and Zeiss Sigma 300 VP FE-SEM, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | 1540EsBZeiss | Sigma 300 VP FE-SEMZeiss |
|---|---|---|
| OEM | Zeiss | Zeiss |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Zeiss 1540EsB | Zeiss Sigma |
| Specifications | ||
| System type | FIB/SEM system[1] | — |
| Electron column | FESEM electron column[1] | — |
| Imaging resolution | resolution approaching the 2 nm range[1] | — |
| Ion column | Ga ion column[1] | — |
| Milling capability | allows for milling (sputtering) of materials from the sample[1] | — |
| Deposition materials | Pt, W, and SiOx[1] | — |
| Gas Injection System etch gases | XeF2 and H2O[1] | — |
| Detector options | multiple detector options for different imaging modes[1] | — |
| Configuration | — | 50/60 Hz[2] |
| 1/N/PE | — | 230 Vac[2] |
| 2/PE | — | 208 Vac[2] |
Plan your fab
Building a Metrology & Inspection process? Get a complete equipment list.
Open the fab equipment planner →