Waferpedia

Comparison ledger

Leo 1530 FE-SEM versus O Inspect 322 CMM

Zeiss Leo 1530 FE-SEM and Zeiss O Inspect 322 CMM, side by side. Every value shown is drawn from its cited encyclopedia entry.

Side-by-side comparison of selected equipment models
Attribute
OEMZeissZeiss
CategoryMetrology & InspectionMetrology & Inspection
Wafer size
Process node
Introduced
Production run
Lifecycle
Lifecycle milestones
Control system
Generation
FamilyZeiss LEOZeiss O Inspect 322 CMM
Cited variants
  • O-INSPECT 3 / 2 / 2[1]
Specifications
ConfigurationFour-Quadrant Backscattered Electron Detector (4QBSD)[2]Measuring volume X = 300 mm, Y = 200 mm, Z = 200 mm[3]
OXFORD 6901 EDX Detector with resolution133 eV at 5.9 KeV[2]
Determination area10 mm²[2]
P/N636520-9932-000[1]

Plan your fab

Building a Metrology & Inspection process? Get a complete equipment list.

Open the fab equipment planner →
Sources (3)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]inventory listing
  3. [3]inventory listing