Waferpedia

Comparison ledger

, Tokyo Semitsu Kogaku (TSK) UF200versusCG 4100

Accretech , Tokyo Semitsu Kogaku (TSK) UF200, Hitachi CG 4100, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
CG 4100Hitachi
OEMAccretechHitachi
Category——
Wafer sizeWafer EquipmentWafer Equipment
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyAccretech , Tokyo Semitsu Kogaku (TSK) UF200Hitachi CG 4100
Specifications
Wafer sizeWafer Equipment[1]Wafer Equipment[2]
Date of Manufacture1998[1]2013-01-01[2]
Currently Configured for200mm[1]300mm[2]
Current Equipment StatusAvailable[1]—
Available dateCurrently Available[1]—
Equipment categoryProduction Wafer Prober[1]—
Missing or Damaged parts—Fab confirmed there were no missing or damaged parts.[2]
Vendor—HITACHI[2]
VID—VID761[2]
SW Version—35.47[2]
Resolution—1.8nm[2]
throughput—42wafer/h[2]
MAM Time—2.8sec[2]
Stage Landing Accuracy—±1μm[2]
Sources (2)Every fact above is drawn from these public sources
  1. [1]dealer listingwotol.com
  2. [2]dealer listingwotol.com