Hitachi

CG 4100

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Provisional entry — research in progress

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Wafer size

Wafer Equipment

Performance

±1μm^[1]

Optics

1.8nm^[1]

What is it?

The Hitachi CG 4100 is a CD-SEM (critical dimension scanning electron microscope) used for metrology and inspection of semiconductor wafers.

What do the numbers mean?

Wafer handling2

Wafer size: Wafer Equipment^[1]
throughput: 42wafer/h^[1]

Optics & imaging1

Resolution: 1.8nm^[1]

Performance1

Stage Landing Accuracy: ±1μm^[1]

Configuration & options7

Date of Manufacture: 2013-01-01^[1]
Currently Configured for: 300mm^[1]
Missing or Damaged parts: Fab confirmed there were no missing or damaged parts.^[1]
Vendor: HITACHI^[1]
VID: VID761^[1]
SW Version: 35.47^[1]
MAM Time: 2.8sec^[1]

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Not publicly documented

Field notes

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Not publicly documented

The following facts about the CG 4100 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the CG 4100 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the CG 4100 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the CG 4100 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the CG 4100 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the CG 4100 is not on record.
Answerable by: an OEM datasheet or a fab qualification report