Comparison ledger
Agilent 1100 HPLC, Applied Materials 0010-03485 Magnet Assy, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1100 HPLCAgilent | 0010-03485 Magnet AssyApplied Materials |
|---|---|---|
| OEM | Agilent | Applied Materials |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | 1995– | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Agilent 1100 HPLC | Applied Materials 0010-03485 Magnet Assy |
| Specifications | ||
| Platform | Modular HPLC system[1] | — |
| Introduction year | 1995[1] | — |
| Control options | Handheld controller, Agilent ChemStation, or LAN-based control[2] | — |
| Pump configurations | Isocratic, binary, quaternary, capillary, and preparative pumps[2] | — |
| Detector types | Variable, multiwavelength, diode-array, mass selective, refractive index, and fluorescence detectors[2] | — |
| Thermostatted column compartment | Peltier-based design with ambient, subambient, and above-ambient operation[2] | — |
| Diode-array detector wavelength range | 190 to 950 nm[2] | — |
| Diode-array detector diodes | 1024 diodes[2] | — |
| Binary pump flow range | 0.001 to 5 mL/min setpoints[2] | — |
| Binary pump pressure range | 0 to 400 bar[2] | — |
| Configuration | — | WP AL 300mm PVD[3] |
| OEM | — | Applied Materials[3] |
| Model | — | 0010-03485[3] |
| Description | — | MAGNET ASSY, WP AL 300MM PVD[4] |
| Process | — | PVD[5] |
| Wafer size | — | 300mm[6] |
| Version | — | Spares[6] |
| Part Number | — | 0010-03485[3] |
| Manufacturer | — | Applied Materials[3] |
| Process Type | — | PVD (Physical Vapor Deposition)[3] |
| Application (Material) | — | Aluminum (AL)[3] |
| Wafer Diameter (associated) | — | 300 mm[3] |