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0010-03254 E ChuckversuseMax CT Plus

Applied Materials 0010-03254 E Chuck, Applied Materials eMax CT Plus, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
0010-03254 E ChuckApplied Materials
eMax CT PlusApplied Materials
OEMApplied MaterialsApplied Materials
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
Family—Applied Materials eMax
Specifications
Configuration—With Genesis GHW-50A RF Generator[1]
OEM—Applied Materials[2]
Model—eMax CT Plus[1]
Type—dry etcher[2]
Process—silicon nitride etch[2]
Description—eMax CT+ dielectric etch chamber[3]
Wafersize—300 mm[3]
Version—300 mm[4]
Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]ptwsingapore.comptwsingapore.com
  4. [4]fabsurplus.comfabsurplus.com