Comparison ledger
Applied Materials 0010-03485 Magnet Assy, CEE Apogee Spin, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | Apogee SpinCEE |
|---|---|---|
| OEM | Applied Materials | CEE |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | CEE Apogee |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | Polymide[5] |
| OEM | Applied Materials[1] | CEE[5] |
| Model | 0010-03485[1] | Apogee[5] |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | — |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | — |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Equipment name | — | CEE Apogee Spin Coater[6] |
| Installed modules | — | Spin coater, bake plate, and vapor primer bake plate[7] |
| Spin chuck type | — | Circular vacuum chucks[7] |
| Recommended substrate size range for 4-inch chuck | — | 5 inches to 8 inches in diameter (125 mm to 200 mm)[7] |
| Spin coater standard substrate thickness | — | 275-750 μm[7] |
| Maximum recommended spin speed and acceleration range | — | 3,000 to 6,000 rpm for standard thickness substrates[7] |
| Bake plate holding temperature | — | 115 degrees C[7] |
| Vapor HMDS bake plate holding temperature | — | 100 degrees C[7] |