Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Edwards IQDP 80 Dry Vacuum, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | IQDP 80 Dry VacuumEdwards |
|---|---|---|
| OEM | Applied Materials | Edwards |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Edwards IQDP 80 |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | Refurbished[5] |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | IQDP 80[8] |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | — |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | Edwards[8] |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Phase | — | 3 Phase[6] |
| Frequency | — | 60 Hz[6] |
| Voltage | — | 480 V[6] |
| Type | — | Dry Vacuum Pump[8] |
| System description | — | Semiconductor pumping system[9] |
| Typical peak pumping speed at 60 Hz | — | 96 m3/h-1[9] |
| Maximum continuous inlet pressure | — | 1x10*5 Pa[9] |
| Inlet connection | — | ISO 63[9] |
| Outlet connection | — | NW 40[9] |
| Condition | — | Rebuilt[10] |
| Part number | — | A53280905[10] |
| Inlet | — | ISO63 bolted[10] |
| Exhaust | — | KF40[10] |
| Motor | — | 3 Phase, 200-460V, 50/60Hz[10] |
| Pumping speed | — | 56.5 CFM (60Hz)[10] |
| Ultimate vacuum | — | 7.5 x 10-3 Torr (60Hz)[10] |
| Weight | — | 477 lbs[10] |