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Comparison ledger

0010-03485 Magnet AssyversusXDS-5

Applied Materials 0010-03485 Magnet Assy, Edwards XDS-5, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
XDS-5Edwards
OEMApplied MaterialsEdwards
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyEdwards XDS-5
Specifications
ConfigurationWP AL 300mm PVD[1]—
OEMApplied Materials[1]Edwards[5]
Model0010-03485[1]—
DescriptionMAGNET ASSY, WP AL 300MM PVD[2]—
ProcessPVD[3]—
Wafer size300mm[4]—
VersionSpares[4]—
Part Number0010-03485[1]—
ManufacturerApplied Materials[1]—
Process TypePVD (Physical Vapor Deposition)[1]—
Application (Material)Aluminum (AL)[1]—
Wafer Diameter (associated)300 mm[1]—
Referenced pump model—XDS-5[5]
Manufacturer information document—Edwards XDS-5 pump manual[6]
Product type—Dry vacuum pump[6]
Maximum displacement at 50 Hz—5.7 m3/hr[6]
Maximum displacement at 60 Hz—6.7 m3/hr[6]
Maximum pumping speed at 50 Hz—4.8 m3/hr[6]
Maximum pumping speed at 60 Hz—6.0 m3/hr[6]
Maximum permitted inlet pressure and gas-ballast inlet pressure—0.5 bar gauge[6]
Maximum permitted outlet pressure—1 bar gauge[6]
Inlet/outlet connection—DN25NW[6]
Mass—23 kg[6]
Sound pressure at ultimate vacuum—55 dB(A) at 1 m[6]
Vibration at inlet port—<4.5 mm/s rms[6]
Sources (6)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]layla-ec.comlayla-ec.com
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]nanofab.utah.edunanofab.utah.edu
  6. [6]nanofab.utah.edunanofab.utah.edu