Waferpedia

Comparison ledger

0010-03485 Magnet AssyversusAlcatel ATH 2300 M Turbo

Applied Materials 0010-03485 Magnet Assy, Pfeiffer Alcatel ATH 2300 M Turbo, side by side. Every value shown is drawn from the cited encyclopedia entries.

Email
Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
OEMApplied MaterialsPfeiffer
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyPfeiffer Alcatel
Specifications
ConfigurationWP AL 300mm PVD[1]With ACT 1300 M Turbo Pump Controller/Drive[5]
OEMApplied Materials[1]—
Model0010-03485[1]ATH 2300 M[5]
DescriptionMAGNET ASSY, WP AL 300MM PVD[2]—
ProcessPVD[3]—
Wafer size300mm[4]—
VersionSpares[4]—
Part Number0010-03485[1]—
ManufacturerApplied Materials[1]Pfeiffer / Alcatel[5]
Process TypePVD (Physical Vapor Deposition)[1]—
Application (Material)Aluminum (AL)[1]—
Wafer Diameter (associated)300 mm[1]—
Type of product—turbo pump[6]
Part number—Q66621A1[6]
Inlet—ISO250F[6]
Exhaust—KF40[6]
Pumping speed—2,100 l/s (N2)[6]
Compression ratio—> 10^9 (N2)[6]
Ultimate pressure—3 x 10-9 Torr[6]
Weight—102 lbs[6]
Recommended controller—ACT-2300M[6]
Recommended backing pump—ADP • ADS[6]
Controller/drive—ACT 1300 M Turbo Pump Controller/Drive[7]
Sources (7)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]layla-ec.comlayla-ec.com
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]waferpedia.comwaferpedia.com
  6. [6]provac.comprovac.com
  7. [7]Equipment inventory listing