Comparison ledger
Applied Materials 0010-13622 RF Match for, ASM E 2000 EPI Reactor, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | |
|---|---|---|
| OEM | Applied Materials | ASM |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | 2008 Refurbished |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | ASM E 2000 EPI Reactor |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[1] | E 2 Upgraded to E 2000[2] |
| Model | 0010-13622[1] | E 2000[2] |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[1] | — |
| Feature | High Efficiency HE RF Match-Bias[1] | — |
| Make | — | ASM[2] |
| Equipment type | — | EPI Reactor (Epitaxial Silicon Deposition)[2] |
| Wafer size | — | 6 inch[2] |
| Upgrade note | — | Upgraded to E 2000 MPI[2] |
| Refurbishment | — | Refurbished in 2008[2] |
| Vintage | — | 2000 Vintage[2] |
Plan your fab
Building a Deposition process? Get a complete equipment list.
Open the fab equipment planner →