Comparison ledger
Applied Materials 0010-13622 RF Match for, CHA Mark 40 C, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | Mark 40 CCHA |
|---|---|---|
| OEM | Applied Materials | CHA |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | CHA Mark 40 |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[1] | CHA SR-10 E-Beam Power Supply (10kW)[2] |
| Model | 0010-13622[1] | — |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[1] | — |
| Feature | High Efficiency HE RF Match-Bias[1] | — |
| Process Chamber Dimensions | — | 26” x 26”[2] |
| Crucible | — | 4 pockets, 15cc each[2] |
| Power | — | 10kW Heater Power Supply (CHA HPS-671-10)[2] |
| Ion Gauge Tube | — | IG-100N[2] |
| Type | — | Evaporator[3] |
| Category | — | Deposition[3] |
| Power supply | — | CHA SR-10 E-Beam Power Supply (10kW)[2] |
| Electron beam source | — | CHA T271-4-1 Electron Beam Source[2] |
| Beam sweep controller | — | CHA Beam Sweep Controller[2] |
| Pump cycle controller | — | CHA Auto Tech-2 Pump Cycle Controller[2] |
| Substrate heat | — | Included[2] |
| Heater power supply | — | 10kW Heater Power Supply (CHA HPS-671-10)[2] |
| Deposition rate controller | — | Sycon STC-200/SQ Deposition Rate Controller[2] |
| Vacuum gauge control | — | Granville Philips 307 Vacuum Gauge Control[2] |
| Pressure/flow controller | — | MKS Type 250 Pressure/Flow Controller[2] |
| Chillers | — | Neslab CFT-150 Chillers, Qty 2[2] |
| Compressor | — | CTI-Cryogenics 8500 Compressor[2] |
| Vacuum pump | — | Edwards E2M40 2-Stage Vacuum Pump[2] |
| Liquid nitrogen level control | — | Included[2] |
| Convectron tube | — | 275-071[2] |
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