CHA
Mark 40 C
Power
CHA SR-10 E-Beam Power Supply (10kW)[1]
Vacuum
CHA Auto Tech-2 Pump Cycle Controller[1]
Optics
CHA T271-4-1 Electron Beam Source[1]
How it works
Where it fits in the process flow
The CHA Mark 40 C includes a CHA Auto Tech-2 pump cycle controller, Granville Philips 307 vacuum gauge control, an MKS Type 250 pressure flow controller, a CTI-Cryogenics 8500 compressor, an Edwards E2M40 2-stage vacuum pump, liquid nitrogen level control, an IG-100N ion gauge tube, and a 275-071 Convectron tube.[1][2]
What do the numbers mean?
Power & electrical4
- CHA SR-10 E-Beam Power Supply (10kW)[1]
Vacuum & pumping10
Wafer handling2
- Substrate Heat[1]
Optics & imaging2
- CHA T271-4-1 Electron Beam Source[1]
Performance2
- Sycon STC-200/SQ Deposition Rate Controller[1]
Control & software8
Dimensions & facilities1
Configuration & options7
- Neslab CFT-150 Chillers, Qty 2[1]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- ConfigurationCHA SR-10 E-Beam Power Supply (10kW)[1]
- ConfigurationCHA Auto Tech-2 Pump Cycle Controller[1]
- Power10kW Heater Power Supply (CHA HPS-671-10)[1]
- ConfigurationGranville Philips 307 Vacuum Gauge Control[1]
- ConfigurationMKS Type 250 Pressure/Flow Controller[1]
- ConfigurationCTI-Cryogenics 8500 Compressor[1]
- ConfigurationEdwards E2M40 2-Stage Vacuum Pump[1]
- Power supplyCHA SR-10 E-Beam Power Supply (10kW)[1]
- Pump cycle controllerCHA Auto Tech-2 Pump Cycle Controller[1]
- Heater power supply10kW Heater Power Supply (CHA HPS-671-10)[1]
- Vacuum gauge controlGranville Philips 307 Vacuum Gauge Control[1]
- Pressure/flow controllerMKS Type 250 Pressure/Flow Controller[1]
- CompressorCTI-Cryogenics 8500 Compressor[1]
- Vacuum pumpEdwards E2M40 2-Stage Vacuum Pump[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the Mark 40 C are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Mark 40 C are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Mark 40 C are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Mark 40 C are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Mark 40 C are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Mark 40 C is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]waferpedia.com — waferpedia.comwaferpedia.com
Last updated Oct 15, 2026.
Compare with similar tools
View all →
The Applied Materials 0010-13622 is an RF match unit intended for PVD (Physical Vapor Deposition) described as a High Efficiency HE RF Match-Bias.
The Applied Materials 0020 12458 Part is an insulator, side match component for the Hdp-Cvd Ultima Plus system.