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0010-13622 RF Match forversusGasonics Vector Extreme

Applied Materials 0010-13622 RF Match for, Lam Research Gasonics Vector Extreme, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
0010-13622 RF Match forApplied Materials
OEMApplied MaterialsLam Research
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-13622 RF Match forLam Research Gasonics Vector
Specifications
ConfigurationHigh Efficiency HE RF Match-Bias[1]Process Module Options:[2]
Model0010-13622[1]Vector Extreme[2]
Product TypeRF Match for PVD (Physical Vapor Deposition)[1]—
FeatureHigh Efficiency HE RF Match-Bias[1]—
Software Version & Build—V5.2[2]
Label Kit—English[2]
Interconnect Cable Length—75 ft[2]
Non-Standard System Features—System NSR 1, System NSR 2[2]
Primary Process—SION[2]
Secondary Process—ARC, USG[2]
RCP Generator—AX 7645[2]
RF Config—SIRF[2]
Top Plate Tubing Size—1/4 in[2]
Chamber Hardware—Nickel Plated Standard[2]
Chamber Gate Valve—Chemraz[2]
HF Generator—Apex 3 KW[2]
LF Generator—PDX 2500[2]
RF Sensor Board—Standard[2]
IREPD Controller—MKS 20704 A 28818, RMU[2]
Software Version and Build—V5.2[3]
Make—Lam / Novellus / Gasonics[2]
Process type—Plasma-Enhanced Chemical Vapor Deposition (PECVD)[2]
Wafer size—12 inch[2]
Secondary processes—ARC, USG[3]
RPC generator—AX 7645[3]
RF configuration—SIRF[3]
Load lock pump—Kashiyama NV60[3]
Control era—Windows XP[3]
O-Rings—Chemraz[2]
Process Manometer—Heated[2]
View Ports—5 Viewpoints[2]
Pedestal Options—Classic conditioned 300 mm[2]
Minimum Contact Area (MCA)—Pin & Ball[2]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]inventory listing