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0010-13622 RF Match forversusHelios 800

Applied Materials 0010-13622 RF Match for, Leybold Helios 800, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
0010-13622 RF Match forApplied Materials
Helios 800Leybold
OEMApplied MaterialsLeybold
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-13622 RF Match forLeybold Helios 800
Specifications
ConfigurationHigh Efficiency HE RF Match-Bias[1]1 x Transfer module w/ vacuum robot incl. Gate valve[2]
Model0010-13622[1]Helios 800[2]
Product TypeRF Match for PVD (Physical Vapor Deposition)[1]—
FeatureHigh Efficiency HE RF Match-Bias[1]—
Line voltage—3AC400V+/-10%[2]
Line frequency—50 Hz[2]
Manufacturer—Leybold[2]
Category—Deposition[3]
Type—Sputter coater[2]
Transfer module—1 x Transfer module w/ vacuum robot incl. Gate valve[2]
Load lock modules—3 x Load lock modules w/ gate valve & cassette for 12 substrate carriers[2]
Vacuum equipment—1 set vacuum equipment including dry pre-vacuum pump unit, turbo molecular pump, vacuum gauges, vacuum pipes & valves[2]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]waferpedia.comwaferpedia.com