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Comparison ledger

0020 17484 PartversusCentura 5200 EPI Reactor

Applied Materials 0020 17484 Part, Applied Materials Centura 5200 EPI Reactor, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
0020 17484 PartApplied Materials
Centura 5200 EPI ReactorApplied Materials
OEMApplied MaterialsApplied Materials
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 17484 PartApplied Materials Centura 5200
Specifications
ConfigurationBar, Cap Bank, Hdpcvd 300mm Ultima X[1]3 atmospheric epi chambers[2]
Manufacturer—Applied Materials[2]
Model—Centura 5200 EPI Reactor[2]
Category—Deposition[3]
Tool type—epitaxial reactor[3]
Atmospheric epi chambers—3[3]
Cool-down chamber—1[3]
Wafer handling robot—HP+ Robot[3]
Loadlocks—Wide Body Loadlocks[3]
Loadlock platform—Universal loadlock platform (200mm or 150mm)[3]
Power & electrical—208V external transformer[3]
Variable speed blower—Included[3]
Center finder—On-The-Fly Center Finder[3]
BMV system—Accusett BMV system[3]
Communications—HSMS GEMSECS[3]
Dopant supply lines—2 mixed dopant supply lines[3]
TCS supply line—Included[3]
Process kits—No process kits included[3]
Vintage—2004[3]
Wafer size—200mm or 150mm[2]
Nickle system—Yes[4]
Toxic gas box—Yes[4]
Voltage—208 Volts[4]
Flash Memory Dr—Yes[4]
Processor—68040[4]
Load locks—WB ENP[4]
Robot—HP[4]
Heat exchanger—Steel[4]
Chamber A—RP Epi[4]
Chamber B—Rp Epi[4]
Chamber C—RP Epi[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]waferpedia.comwaferpedia.com
  4. [4]fab-spares.comfab-spares.com