Waferpedia

Comparison ledger

0020 17484 PartversusE 2000 EPI Reactor

Applied Materials 0020 17484 Part, ASM E 2000 EPI Reactor, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
0020 17484 PartApplied Materials
OEMApplied MaterialsASM
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones—2008 Refurbished
Control system——
Generation——
FamilyApplied Materials 0020 17484 PartASM E 2000 EPI Reactor
Specifications
ConfigurationBar, Cap Bank, Hdpcvd 300mm Ultima X[1]E 2 Upgraded to E 2000[2]
Make—ASM[2]
Model—E 2000[2]
Equipment type—EPI Reactor (Epitaxial Silicon Deposition)[2]
Wafer size—6 inch[2]
Upgrade note—Upgraded to E 2000 MPI[2]
Refurbishment—Refurbished in 2008[2]
Vintage—2000 Vintage[2]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]inventory listing