Waferpedia

Comparison ledger

0020 17484 PartversusConcept One

Applied Materials 0020 17484 Part, Lam Research Concept One, side by side. Every value shown is drawn from the cited encyclopedia entries.

Email
Side-by-side comparison of selected equipment models
Attribute
0020 17484 PartApplied Materials
Concept OneLam Research
OEMApplied MaterialsLam Research
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 17484 PartLam Research Concept One
Cited variants—
  • 6 inch version[1]
  • 8 inch version[2]
Specifications
ConfigurationBar, Cap Bank, Hdpcvd 300mm Ultima X[3]Nitride / TEOS[1]
Phase—3 Phase[1]
Voltage—208V Vac[1]
Host Interface—SECS-[7]
Gas Box Type—External[7]
EMO's—Push Button[7]
One Arm Robot—Lift, Rotate Motor[7]
Wafer size 6 inch—6 inch[1]
Wafer size 8 inch—8 inch[2]
Process types—Nitride, TEOS, TEOS-R[1]
Power requirements—208V, 50/60 Hz, 3 Phase[1]
Vintage year—2012[2]
Processes—Nitride, TEOS[1]
Wafer size—6 inch[1]
Power supply—208V, 50/60 Hz, 3-phase[1]
Vintage (example unit)—2012[2]

Plan your fab

Building a Deposition process? Get a complete equipment list.

Open the fab equipment planner →
Sources (7)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]Equipment inventory listing
  3. [3]inventory listing
  4. [4]inventory listing
  5. [5]inventory listing
  6. [6]inventory listing
  7. [7]inventory listing