Comparison ledger
Applied Materials 0041-39086 ESC Part, Oxford Instruments Plasmalab 100 ICP-RIE, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0041-39086 ESC PartApplied Materials | Plasmalab 100 ICP-RIEOxford Instruments |
|---|---|---|
| OEM | Applied Materials | Oxford Instruments |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | — | Oxford Instruments Plasmalab 100 |
| Specifications | ||
| Process gases used | — | H2, O2, N2, Ar, CF4, SF6, CHF3, He, CH4, HBr, Cl2 and BCl3[1] |
| Cryo Table w/ operating temp | — | -150 to 400C[1] |
| Substrate cooling | — | using liquid nitrogen (LN2)[1] |
| Configuration | — | RF source 300 W, 13.56 MHz[1] |
| Base pressure | — | 5E-7 Torr[1] |
| Main Chamber Backing Pump | — | Adixen ADP 122P Dry pump[1] |
| Main Chamber Turbo Pump | — | Adixen ATH 1300 Turbo[1] |
| Load Lock | — | Adixen ACP 15G Dry pump[1] |
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