Oxford Instruments
Plasmalab 100 ICP-RIE
Plate 01Oxford Plasmalab 100 ICP Etcher (ID# 3811)
ClassOneEngineeringWatch on YouTubePlate 02Oxford Plasmalab 100 ICP Etcher (ID# 3811)
ClassOneEngineeringWatch on YouTubePlate 03Oxford Plasmalab 100 ICP (ID# 3894)
ClassOneEngineeringWatch on YouTubePlate 04Video 1 Oxford Plasmalab 100 ICP System ID# 3589
TechnolutionsWatch on YouTube
Power
RF source 300 W, 13.56 MHz[1]
Vacuum
-150 to 400C[1]
Gas delivery
All Non-corrosive gas lines cleaned[1]
Optics
Horiba Laser Endpoint Detector[1]
What is it?
What do the numbers mean?
Power & electrical2
Vacuum & pumping7
Wafer handling3
Gas & chemistry3
Optics & imaging1
- Horiba Laser Endpoint Detector[1]
Configuration & options4
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Process gases usedH2, O2, N2, Ar, CF4, SF6, CHF3, He, CH4, HBr, Cl2 and BCl3[1]
- Cryo Table w/ operating temp-150 to 400C[1]
- ConfigurationRF source 300 W, 13.56 MHz[1]
- ConfigurationICP source 3000 W, 13.56 MHz[1]
- Base pressure5E-7 Torr[1]
- Main Chamber Backing PumpAdixen ADP 122P Dry pump[1]
- Main Chamber Turbo PumpAdixen ATH 1300 Turbo[1]
- Load LockAdixen ACP 15G Dry pump[1]
- ConfigurationAll corrosive gas lines replaced with brand new[1]
- ConfigurationAll Non-corrosive gas lines cleaned[1]
- ConfigurationVacuum pumps professionally rebuilt[1]
- ConfigurationTurbo pump professionally rebuilt[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the Plasmalab 100 ICP-RIE are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Plasmalab 100 ICP-RIE are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Plasmalab 100 ICP-RIE are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Plasmalab 100 ICP-RIE are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Plasmalab 100 ICP-RIE are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Plasmalab 100 ICP-RIE is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Inventory photo
Last updated Jul 29, 2026.