Comparison ledger
ASML PAS 5500 60, EV Group 101, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | PAS 5500 60ASML | 101EV Group |
|---|---|---|
| OEM | ASML | EV Group |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ASML PAS 5500 | EV Group 101 |
| Specifications | ||
| Configuration | Parts have been swapped out[1] | — |
| Resolution | 450 nm[2] | — |
| Wavelength | 365 nm (i-line)[2] | — |
| Wafer size | 200 mm (eight-inch)[3] | — |
| Throughput | up to 48 wafers per hour (200 mm, 55 exposures, 200 mJ/cm²)[3] | — |
| Design rule | 0.45 µm (450 nm)[3] | — |
| Manufacturer | ASML[1] | — |
| Model | PAS 5500 / 60[1] | 101[7] |
| Technology | i-line stepper[2] | — |
| Exposure wavelength | 365 nm near-UV light[2] | — |
| Maximum die area per exposure | 18 mm by 22.4 mm[6] | — |
| Reduction ratio | 5:1 reducing stepper[6] | — |
| Automatic processing capability | automatic 100 mm wafer cassette processing capability[6] | — |
| OEM | — | EV Group[7] |
| Equipment name | — | EVG 101 Spray Coater[7] |
| NEMO ID | — | evgspraycoat[7] |
| Training required | — | EVG 101 Training[7] |
| Training duration | — | 1.50 hours[7] |
| Processing technique | — | Resist Spray Coat (manual)[7] |
| Cleanliness | — | "All"[7] |
| Location | — | SNF Paul G Allen L107 Cleanroom[7] |
| Wafer diameter (substrate size) | — | up to 300 mm[8] |
| Available modules | — | Spin coat / OmniSpray® / develop[8] |
| Wafer handling options | — | Bowed / warped / thin wafer handling, edge handling[8] |
| Dispense options | — | Various resist dispense pumps covering viscosities up to 52000 cP; constant pressure dispense systems; EBR / BSR / pre-wet / bowl wash / liquid priming[8] |
| Processing technique (at SNF) | — | Resist Spray Coat (manual)[9] |
| Cleanliness group (at SNF) | — | "All"[7] |
Plan your fab
Building a Lithography process? Get a complete equipment list.
Open the fab equipment planner →