Comparison ledger
ASML TWINSCAN NXE:3300, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 150 e MaskSUSS MicroTec | |
|---|---|---|
| OEM | ASML | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | 2013 | — |
| Production run | 2013– | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ASML TWINSCAN NXE:3300 | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Technology | EUV lithography[1] | — |
| Wavelength | 13.5 nm[1] | — |
| Numerical Aperture | 0.33[1] | — |
| Resolution | 13 nm[1] | — |
| Light source | CO2 laser on tin droplets[1] | — |
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