ASML
The TWINSCAN NXE:3300 is an extreme ultraviolet (EUV) lithography system from ASML. The NXE:3300 was the first EUV production system, shipped in 2013. The NXE:3300 uses EUV light at 13.5 nm wavelength and an NA of 0.33.[1]

Produced
2013–
Optics
13.5 nm[1]
Process applications and technology nodes documented for this tool.
First EUV production system shipped
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
No research found yet — worked with this tool? Share what you know.
The following facts about the TWINSCAN NXE:3300 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented variants, configuration options, or revision breakpoints of the TWINSCAN NXE:3300 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the TWINSCAN NXE:3300 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the TWINSCAN NXE:3300 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the TWINSCAN NXE:3300 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the TWINSCAN NXE:3300 are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Last updated Sep 22, 2026.
Brooks 017-0146-01 is a prealigner manufactured by Brooks.
The EVG 101 is an advanced resist processing system for spin or spray coating and developing of wafers up to 300 mm.