Comparison ledger
ASML Twinscan XT 1250 D ArF, Ultratech 1500, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1500Ultratech | |
|---|---|---|
| OEM | ASML | Ultratech |
| Category | Lithography | Lithography |
| Wafer size | — | Wafer loader |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ASML Twinscan XT 1250 | Ultratech 1500 |
| Specifications | ||
| Configuration | 193 nm[1] | 50/60 Hz[4] |
| Exposure wavelength | 193 nm[1] | — |
| Exposure source type | ArF excimer laser[1] | — |
| Category | Lithography[2] | — |
| Family | ASML Twinscan XT 1250[3] | — |
| Wafer size | — | Wafer loader[4] |
| Power | — | 50/60 Hz, 12 Amp[4] |
| Wafer loader | — | Yes[4] |
| Numerical aperture | — | 0.32 NA[5] |
| Exposure source | — | Broadband, gh-line[5] |
| Vintage | — | 2000[4] |
| Illumination | — | Broadband[5] |
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