ASML
Twinscan XT 1250 D ArF
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The ASML Twinscan XT 1250 D ArF is a lithography scanner that uses an ArF excimer laser source at 193 nm. The ASML Twinscan XT 1250 D ArF belongs to the Twinscan XT 1250 family of scanners.[1][2][3][4]
What it is
How it works
General reference — not yet source-verifiedWhere it fits in the process flow
General reference — not yet source-verifiedThe ASML Twinscan XT 1250 D ArF sits in the front end of semiconductor patterning, after wafer preparation and photoresist coating and before development and etch transfer.
The ASML Twinscan XT 1250 D ArF is used when the process flow needs optical pattern transfer onto wafers rather than deposition or etch.
Applications
General reference — not yet source-verifiedThe ASML Twinscan XT 1250 D ArF is used for semiconductor circuit patterning that benefits from deep-ultraviolet ArF exposure.
The ASML Twinscan XT 1250 D ArF belongs to lithography processing used in integrated circuit fabrication.
What do the numbers mean?
Optics & imaging3
- 193 nm[1]
Configuration & options2
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the Twinscan XT 1250 D ArF are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Twinscan XT 1250 D ArF are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Twinscan XT 1250 D ArF are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Twinscan XT 1250 D ArF are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Twinscan XT 1250 D ArF are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Twinscan XT 1250 D ArF is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]inventory listing
- [2]waferpedia.com — waferpedia.comwaferpedia.com
- [3]waferpedia.com — waferpedia.comwaferpedia.com
- [4]ASML Twinscan XT 1250 D ArF vs Ultratech 1500 comparison | Waferpedia — waferpedia.comwaferpedia.com
Last updated Oct 11, 2026.
Compare with similar tools
View all →Brooks 017-0146-01 is a prealigner manufactured by Brooks.
The Ultratech 1000 Family is a photolithography step-and-repeat 1X steppers family using the Wynne Dyson optical design.
The EVG 101 is an advanced resist processing system for spin or spray coating and developing of wafers up to 300 mm.
