Comparison ledger
Axcelis 200 PCU, Varian E 500 EHP, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 200 PCUAxcelis | E 500 EHPVarian |
|---|---|---|
| OEM | Axcelis | Varian |
| Category | Ion Implantation | Ion Implantation |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | 2000 Vintage | — |
| Control system | — | — |
| Generation | — | — |
| Family | Axcelis NV GSD 200 | Varian E 500 EHP |
| Cited variants | — | |
| Specifications | ||
| P/N | SC 4840 A[3] | — |
| Frequency | 50 Hz[3] | 50 Hz[5] |
| Phase | 3 Phase[3] | 3 Phase[4] |
| Voltage | 400 V[3] | 208 V[4] |
| Category | — | Ion Implantation[6] |
| Implanter type | — | Medium current implanter[7] |
| Maximum beam energy | — | 250 kV[4] |
| Wire configuration | — | 5 Wire[4] |
| Wafer size | — | 6"[4] |
| Convertible to 8" | — | Yes[7] |
| Thin wafer handling kit | — | Included[7] |
Plan your fab
Building a Ion Implantation process? Get a complete equipment list.
Open the fab equipment planner →