Comparison ledger
Axcelis 200 PCU, Varian E 500 EHP Ion Implant, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 200 PCUAxcelis | E 500 EHP Ion ImplantVarian |
|---|---|---|
| OEM | Axcelis | Varian |
| Category | Ion Implantation | Ion Implantation |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | 2000 Vintage | — |
| Control system | — | — |
| Generation | — | — |
| Family | Axcelis NV GSD 200 | Varian E 500 EHP Ion Implant |
| Cited variants | — | |
| Specifications | ||
| P/N | SC 4840 A[3] | — |
| Frequency | 50 Hz[3] | — |
| Phase | 3 Phase[3] | 208 Volts, 3 Phase[7] |
| Voltage | 400 V[3] | — |
| Manufacturer | Axcelis[3] | — |
| Model | 200 PCU[3] | — |
| Category | Ion Implantation[4] | — |
| Tool type | photoresist stabilizer[5] | — |
| Wafer size capability | 200 mm[6] | — |
| Electrical | 50 Hz, 3 phase, 400 V[3] | — |
| Operation | cassette-to-cassette operation[1] | — |
| Interface | SECS software interface[1] | — |
| Source generation hardware | high-intensity mercury lamp and 2.45 GHz magnetrons for UV radiation generation[4] | — |
| Configuration | — | 50/60Hz, 5 Wire[7] |
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