Comparison ledger
Axcelis 200 PCU Photoresist Stabilizer, CEE 200 Spin, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 200 SpinCEE | |
|---|---|---|
| OEM | Axcelis | CEE |
| Category | Resist Processing | Resist Processing |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Axcelis NV GSD 200 | CEE 200 |
| Specifications | ||
| Configuration | 14 Amps[1] | 1 Phase[4] |
| Voltage | 380 V[1] | — |
| Frequency | 50 Hz[1] | — |
| Phase | 3 Phase[1] | 1 Phase[4] |
| Manufacturer | Axcelis[3] | — |
| Model | 200 PCU[3] | 200[4] |
| Tool type | photoresist stabilizer[3] | — |
| Category | Resist Processing[3] | — |
| Power | 14 Amps[1] | — |
| Type | — | Spin Coater[4] |
| Make | — | CEE[4] |
| Wafer Sizes | — | 8 inch[4] |
| Equipment type | — | Spin Coater[4] |
| Spin speed | — | 5000 rpm[5] |
| Substrate support | — | Flat substrates up to 200 mm or fragments[5] |
| Substrate thickness max | — | 12 mm[5] |
| Coating thickness | — | Uniform coating thickness up to 100 µm[5] |
Plan your fab
Building a Resist Processing process? Get a complete equipment list.
Open the fab equipment planner →