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200 PCU Photoresist StabilizerversusSK 80 BW-AVPE

Axcelis 200 PCU Photoresist Stabilizer, SCREEN SK 80 BW-AVPE, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
OEMAxcelisSCREEN
CategoryResist ProcessingResist Processing
Wafer size—Wafer Transfer Robot x 1 (1 Block System)
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyAxcelis NV GSD 200SCREEN SK 80
Specifications
Configuration14 Amps[1]4 Cassette Loading Port[4]
Voltage380 V[1]100V, 3.5 kW[5]
Frequency50 Hz[1]—
Phase3 Phase[1]—
ManufacturerAxcelis[3]—
Model200 PCU[3]SK 80 BW-AVPE[4]
Tool typephotoresist stabilizer[3]—
CategoryResist Processing[3]—
Power14 Amps[1]100V, 3.5 kW; 208V, 9.4 kW; 208V, 8.4 kW[5]
Process—Photo[4]
Cassette Index Station—4 Side Loading[4]
Wafer size—Wafer Transfer Robot x 1 (1 Block System)[4]
PR Resist Pump—Iwaki Bellows Pump 4 Set Per 1 Spin Unit[4]
Wafer Flow Direction—Right to Left[4]
Main Body—CCD, ETU, TCU, Power Unit (USA)[5]
OEM—SCREEN / DNS[4]
Equipment type—Coater / Developer[4]
Cassette loading port—4 cassette loading port[4]
Layout—2 coater & 2 developer layout[4]
Wafer transfer—Wafer Transfer Robot x 1 (1 Block System)[4]
Main body components—CCD, ETU, TCU, Power (USA)[4]
Vintage—1995[4]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]waferpedia.comwaferpedia.com
  4. [4]inventory listing
  5. [5]inventory listing