Comparison ledger
Axcelis 200 PCU Photoresist Stabilizer, Veeco 3303 Lift Off, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 3303 Lift OffVeeco | |
|---|---|---|
| OEM | Axcelis | Veeco |
| Category | Resist Processing | Resist Processing |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Axcelis NV GSD 200 | Veeco 33xx |
| Specifications | ||
| Configuration | 14 Amps[1] | HVS (High Velocity Spray) Chamber up to 40 PSI[4] |
| Voltage | 380 V[1] | — |
| Frequency | 50 Hz[1] | — |
| Phase | 3 Phase[1] | — |
| Manufacturer | Axcelis[3] | — |
| Model | 200 PCU[3] | 3303[4] |
| Tool type | photoresist stabilizer[3] | — |
| Category | Resist Processing[3] | — |
| Power | 14 Amps[1] | — |
| HPC solvent lift off process | — | 500-2300 PSI1)[4] |
| Machine type | — | Lift Off Machine[5] |
| Wafer size | — | 6 inch[4] |
| Process | — | HPC solvent lift off process[4] |
| Process pressure | — | 500-2300 PSI[4] |
| Chamber pressure | — | up to 40 PSI[5] |
| OEM | — | Veeco / SSEC[4] |
| HVS chamber pressure | — | up to 40 PSI[4] |
| Vintage | — | 2006[4] |
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