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Comparison ledger

NV GSD VHEversus160 XP

Axcelis NV GSD VHE, Varian 160 XP, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
NV GSD VHEAxcelis
160 XPVarian
OEMAxcelisVarian
CategoryIon ImplantationIon Implantation
Wafer sizeWafer tilt—
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyAxcelis NV GSD VHEVarian 160 XP
Cited variants—
Specifications
Wheel typeFull disk 17 wafers[2]—
Wafer sizeWafer tilt[2]—
SourceBernas[2]—
Extraction systemTriple axes[2]—
GasesArsenic, Boron, Phosphine (SDS), all bottles removed. There is also present plumbing for one Xe bottle.[2]—
ConfigurationSDS Gas box[2]—
Max implantation energy (in KeV)4.2 MeV (14 resonator configuration).[2]—
Max Extraction voltage (in KeV)90[2]—
Orienter typeflat[2]—
Hydrogen implantation availableno[2]—
PFSHD[2]—
Software version5.6[3]—
ManufacturerAxcelis[4]—
ModelNV GSD VHE[4]—
CategoryIon Implantation[4]—
Wafer size / handlingWafer tilt[4]—
Max implantation energy4.2 MeV (14 resonator configuration)[2]—
Max extraction voltage90 keV[4]—
High currentFor High Current[3]—
Vintage2001 Vintage[3]—
Wafer handlingwafer tilt[4]—
Software platformSun SparcStation5 with O/S V 3.8.3[2]—
Configuration (160 XP Ion variant)—150mm High Current IMP[1]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]inventory listing
  3. [3]inventory listing
  4. [4]waferpedia.comwaferpedia.com