Axcelis
NV GSD VHE
Wafer size
Wafer tilt
Power
90[1]
Performance
Source extraction alignment jig[1]
Gas delivery
SDS Gas box[1]
Optics
Beamline column[1]
What it is
The Axcelis NV GSD VHE is an ion implantation tool.[3]
How it works
Where it fits in the process flow
General reference — not yet source-verifiedIon implantation belongs in the dopant introduction step of semiconductor fabrication after patterning defines where dopants should enter the wafer.
What do the numbers mean?
Power & electrical2
Wafer handling7
- Load and unload locks[1]
Gas & chemistry6
Optics & imaging1
- Beamline column[1]
Performance1
- Source extraction alignment jig[1]
Control & software3
Configuration & options19
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- GasesArsenic, Boron, Phosphine (SDS), all bottles removed. There is also present plumbing for one Xe bottle.[1]
- ConfigurationSDS Gas box[1]
- Max Extraction voltage (in KeV)90[1]
- ConfigurationGas box terminal[1]
- GasesSF6, Argon[2]
- GasesArsenic, Boron, Phosphine (SDS), all bottles removed; plumbing for one Xe bottle also present[1]
- Max extraction voltage90 keV[3]
- GasesArsenic, Boron, Phosphine (SDS); SF6, Argon[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What is the maximum implantation energy of the NV GSD VHE?
The maximum implantation energy is 4.2 MeV in the 14-resonator configuration.[1][3]
What is the maximum extraction voltage of the NV GSD VHE?
Not publicly documented
The following facts about the NV GSD VHE are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the NV GSD VHE are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the NV GSD VHE are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the NV GSD VHE are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the NV GSD VHE are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the NV GSD VHE is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Inventory photo
- [3]waferpedia.com — waferpedia.comwaferpedia.com
Last updated Oct 13, 2026.
Compare with similar tools
View all →The Varian 0216 7696, E 11368072 ESC is an electrostatic chuck (ESC) platen of the ADV-S type, categorized under ion implantation equipment.
The Varian 160 XP is an ion implanter. A variant, the Varian 160 XP Ion, is configured as a 150 mm high-current implanter.
The Varian 160 XP Ion is an ion implantation tool configured as a 150mm high-current implanter.